PiPi

Small and compact, suitable for R&D purposes

  • Compact design, RIE (Reactive Ion Etching) mode
  • Economical plasma cleaning machine
  • Simple plasma processing operation
  • Among the plasmatized gases, in addition to ions and electrons, there are electrically neutral atoms and molecules that electrons have moved to the electrical excitation
  • By sputtering effect by ions, it is possible to remove not only organic matter on the surface of the object but also inorganic matter
SKU: 1751 Category: Tag:

Description

Plasma Cleaner (Parallel Electrode, Compact)

Small and compact, suitable for R&D purposes